共搜索到2条信息,每页显示10条信息,共1页。用时:0小时0分0秒132毫秒
Trans. Nonferrous Met. Soc. China 23(2013) 2431-2438 5-methyl-1H-benzotriazole as potential corrosion inhibitor for electrochemical-mechanical planarization of copper Yan-fei BIAN, Wen-jie ZHAI, Bao..., the corrosion inhibition efficiency of 5-methyl-1H-benzotriazole (m-BTA) is higher than that of benzotrizaole (BTA). The inhibition capability of the m-BTA passive film formed......
of electrolytes and the material removal mechanisms for Cu electrochemical mechanical planarization (ECMP) at different pH values including 5-methyl-1H-benzotriazole (TTA), hydroxyethylidenediphosphoric... dissolution rate. This understanding is beneficial for optimization of ECMP processes.Key words:electrochemical mechanical polishing; electrolyte composition; removal mechanism; 5-methyl-1H-benzotriazole......